HfNCl
Type: Volume Composition show more
ObjectId: 5566 ExternalId: 4550
Created: 2/1/2023 3:33:22 PM by Vic) Dudarev Victor [vic_dudarev@mail.ru]
Access: Public Sort Code (asc): 0
Description: HfNCl
[no file attached]
: Cl-Hf-N
Composition
| Element | Absolute | Percentage | |
|---|---|---|---|
| Hf | 1 | 33.333 % | |
| N | 1 | 33.333 % | |
| Cl | 1 | 33.333 % |
Associated Objects
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Wang N.,Ye G.,Hu G.,Meng F.,Shang C.,Shi M.,Ying J.,Chen X. Absence of
Literature ReferenceWang N.,Ye G.,Hu G.,Meng F.,Shang C.,Shi M.,Ying J.,Chen X. Absence of van der Waals Gap in Ternary Thorium Nitride ThNF and ThNCl
All properties (except table)
No properties found
The table
| CrystalSystem | StructureType | SpaceGroup | Eg | IsCalculated | ReferenceId | Comment |
|---|---|---|---|---|---|---|
| Rhombohedral | SmSI | R3(-)m | 2.5 | 0 | 1237 | UV-vis diffuse reflectance spectroscopy |